Optimization of Lithography Performance at Different Manhattan Levels of ILT and Electron Beam Shot Size

Cuixiang Wang, Yu Mu, Futian Wang,Juan Wei, Ruihua Liu, Enqiang Tian,Di Liang,Yufei Sha, Yaokun Li, Hao Yang,Song Sun,Miao Jiang,Qingchen Cao,Jiangliu Shi

Photomask Technology 2024（2024）

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