谷歌浏览器插件
订阅小程序
在清言上使用
VIPCreated with Sketch.

Hf0.5Zr0.5O2/HfO2/Hf0.5Zr0.5O2 Laminated Thin Films and CF4 Plasma Passivation for Improved Memory and Synaptic Characteristics of Ferroelectric Field-Effect Transistors.

Kyungsoo Park,Chulwon Chung, Boncheol Ku, Seunghyeon Yun, Junhyeok Park,Changhwan Choi

Nanoscale（2025）

引用 0|浏览4
AI 理解论文
溯源树
样例
生成溯源树，研究论文发展脉络
Chat Paper
正在生成论文摘要