Rectification of Extreme Ultraviolet Lithography Patterns by Directed Self-Assembly: a Roughness and Defectivity Study

Julie Van Bel,Lander Verstraete,Hyo Seon Suh,Philippe Bezard,Alain Moussa,Andreia Santos,Youngjun Her,Stefan De Gendt

JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3（2024）

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directed self-assembly,pattern rectification,polystyrene-block-polymethyl methacrylate,extreme ultraviolet lithography,extreme ultraviolet stochastics

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