Enhancement of Raman and Photoluminescence Intensity of Monolayer MoS2 Using Engineered Substrates Via Grayscale Electron-Beam Lithography
ACS APPLIED NANO MATERIALS（2025）
Key words
grayscale electron-beamlithography (g-EBL),dose modulation,2D materials,Raman,photoluminescence,multireflection model(MRM),monolayer MoS2
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