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Implementation and Comprehensive Investigation of Gate Engineered Si0.1Ge0.9/GaAs Charged Plasma Based JLTFET for Improved Analog/ RF Performance

Pranita Soni,Aditya Jain, Kaushal Kumar, Lokesh Kumar Soni,Ajay Kumar,Neha Gupta, Amit Kumar Goyal,Rakesh Saroha

RESULTS IN ENGINEERING(2025)

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Key words
JLTFET,Dual-dielectric gate,Heterogeneous material,Charge plasma concept,Band-to-band tunneling
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