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Integrating 3T-DRAM into 1T Layout with Substrate Bipolar Effect Using 22 Nm FDSOI Technology

Hui Xie, Jingya Cao, Rongshan He,Peng Zhou,Yu-Long Jiang, Yong Xu,Fanyu Liu,Jing Wan

IEEE Electron Device Letters(2024)

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Key words
3T-DRAM,1T layout,BIS-DRAM,non-destructive and in-situ reading,random access,22nm FDSOI technology
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