Impact of Tetrakis(ethylmethylamino)-based Precursor and Oxygen Source Selection on Atomic Layer Deposition of Ferroelectric HfxZr1-xO2 Thin Films

Jin-Hyun Kim, Siun Song, Dushyant M. Narayan,Dan N. Le, Thi Thu Huong Chu, Minjong Lee, Geon Park, Seungbin Lee, Jongmug Kang,Jeffrey Spiegelman,Marshall Benham,Si Joon Kim,Rino Choi,Jiyoung Kim

APPLIED SURFACE SCIENCE（2025）

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关键词

Hafnium Zirconium Oxide,Atomic layer deposition,Cocktail precursor,Hydrogen peroxide,Ferroelectric

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