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Optimization of Parameters for the Preparation of AlN Powder/thin Films by Tris(n,n,n’,n’-Tetramethylethylenediamine) Al(iii) Chloride Precursor

Himanshi Chaurasia,Santosh K. Tripathi,Kamlesh Bilgaiyan, Mayank Dwivedi

JOURNAL OF COORDINATION CHEMISTRY（2024）

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Key words
Aluminum nitride,silicon,single source precursor,N,N,N',N'-tetramethylethylenediamine-Al(III)Cl-3,X-ray photoelectron spectroscopy,XRD
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