Enhanced Oxidation Resistance and Interface Stability of Atomic-Layer-Deposited MoNx Electrodes Via TiN Passivation for DRAM Cell Capacitor Applications.
ACS APPLIED MATERIALS & INTERFACES（2024）
关键词
molybdenum nitride,plasma-enhanced atomic-layerdeposition,TiN passivation,DRAM capacitor,oxidationresistance,interface stability
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