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Evolution of the Liquid/Solid Interface Roughness in Si1-Xgex Layers Processed by Nanosecond Laser Annealing

R. Demoulin,R. Daubriac,S. Kerdiles,L. Dagault,O. Adami,D. Ricciarelli,J. -m. Hartmann,F. Chiodi,A. M. Mio,M. Opprecht,E. Scheid,P. Acosta Alba,D. Debarre,A. La Magna,F. Cristiano

APPLIED SURFACE SCIENCE（2025）

Cited 0|Views7
Key words
Pulsed laser annealing,Silicon-germanium,Strain,Liquid-solid interface,Roughness
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