订阅小程序
旧版功能

High-NA EUV Mask Pattern Characterization Using Advanced Mask CD-SEM Metrology

Joost Bekaert,Balakumar Baskaran,Lieve Van Look,Joern-Holger Franke,Vicky Philipsen,Ardavan Niroomand,Eric Hendrickx,Hideaki Komami, Tatsuro Okawa,Soichi Shida, Shinichi Kojima,Toshimichi Iwai

39TH EUROPEAN MASK AND LITHOGRAPHY CONFERENCE, EMLC 2024（2024）

引用 0|浏览8
关键词
High-NA EUV,anamorphic,mask metrology,mask SEM
AI 理解论文
溯源树
样例
生成溯源树，研究论文发展脉络
Chat Paper
正在生成论文摘要