TEOS-PECVD Films for High-Quality SiO2 Cladding Layers in Si3N4-Photonics with Low Mechanical Stress and Optical Loss
2024 Photonics North (PN)（2024）
Key words
TEOS-PECVD,SiO2 top cladding,Multistep deposition,Annealing,Mechanical residual stress,Propagation loss
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