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Simulation and Fabrication of Monolithic III–V Photodetectors on Si: the Role of Growth Facets and Localization of Heterojunctions

IEEE TRANSACTIONS ON ELECTRON DEVICES(2024)

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Silicon,Photonics,Performance evaluation,Indium phosphide,III-V semiconductor materials,Substrates,Optical device fabrication,III-V,fabrication,nanoelectronics,nanowires (NWs),optoelectronics,photodetectors (PDs),simulations,technology computer-aided design (TCAD),template-assisted selective epitaxy (TASE)
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