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Local Interface RF Passivation Layer Based on Helium Ion-Implantation in High-Resistivity Silicon Substrates

M. Perrose,P. Acosta Alba,S. Reboh,J. Lugo,C. Plantier,P. Cardinael,M. Rack,F. Allibert,F. Milesi,X. Garros,J-P Raskin

2024 IEEE/MTT-S INTERNATIONAL MICROWAVE SYMPOSIUM, IMS 2024（2024）

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Key words
RF-SOI,harmonic distortion,effective resistivity,Local passivation layer,helium implantation,FD-SOI co-integration
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