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Study of Inner Spacer Module Process for Gate All Around Field Effect Transsistors

Chaoran Yang,Junjie Li,Enxu Liu, Na Zhou, Longrui Xia,Chenchen Zhang, Zhenhen Kong, Janfeng Gao,Rui Chen,Hua Shao,Tao Yang,Junfeng Li,Jun Luo,Wenwu Wang

ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY（2024）

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Key words
inner spacer,gate-all-around (GAA),nanostructure manufacture,nanosheet,source/drain epitaxy,dry etch,LPCVD
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