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Effects of a Spike-Annealed HfO2 Gate Dielectric Layer on the On-Resistance and Interface Quality of AlGaN/GaN High-Electron-Mobility Transistors

Gyuhyung Lee, Jeongyong Yang,Min Jae Yeom, Sisung Yoon,Geonwook Yoo

Electronics(2024)

Cited 0|Views4
Key words
AlGaN/GaN,HEMTs,HfO2,spike annealed
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