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Electrical Stability of MOS Structures with AlON and Al$_{\text{2}}$O$_{\text{3}}$ Dielectrics Deposited on N-and P-Type GaN

IEEE TRANSACTIONS ON ELECTRON DEVICES(2024)

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关键词
Dielectrics,Capacitors,Logic gates,Semiconductor device measurement,Threshold voltage,Stability criteria,Electrons,AlON,GaN power devices,threshold voltage stability
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