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Kinetic Modeling Analysis of Ar Addition to Atmospheric Pressure N2-H2 Plasma for Plasma-Assisted Catalytic Synthesis of NH3

JOURNAL OF PHYSICAL CHEMISTRY A(2024)

Princeton Univ

Cited 2|Views29
Abstract
Zero-dimensional kinetic modeling of atmospheric pressure Ar-N-2-H-2 nonthermal plasma was carried out to gain mechanistic insights into plasma-assisted catalytic synthesis of ammonia. Ar dilution is a common technique for tailoring plasma discharge properties and has been shown to enhance NH3 formation when added to N-2-H-2 plasma. The kinetic model was developed for a coaxial dielectric barrier discharge quartz wool-packed bed reactor operating at near room temperature using a kHz-frequency plasma source. With 30% Ar mixed in a 1:1 N-2-H-2 plasma at 760 Torr, we find that NH3 production is dominated by Eley-Rideal (E-R) surface reactions, which heavily involve surface NHx species derived from N and H radicals in the gas phase, while the influence of excited N-2 molecules is negligible. This is contrary to the commonly proposed mechanism that excited N-2 molecules created by Penning excitation of N-2 by Ar(4s) and Ar(4p) play a significant role in assisting NH3 formation. Our model shows that the enhanced NH3 formation upon Ar dilution is unlikely due to the interactions between Ar and H species, as excited Ar atoms have a weak effect on H radical formation through H-2 dissociation compared to electrons. We find that excited Ar atoms contribute to 28% of the N radical production in the gas phase via N-2 dissociation, while the rest are dominated by electron-impact dissociation. Furthermore, Ar species play a negligible role in the product NH3 dissociation. N-2 conversion sensitivity analyses were carried out for electron number density (n(e)) and reduced electric field (E/N), and contributions from Ar to gas-phase N radical production were quantified. The model can provide guidance on potential reasons for observing enhanced NH3 formation upon Ar dilution in N-2-H-2 plasma beyond changes in the discharge characteristics.
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Atmospheric Pressure Plasmas,Artificial Nitrogen Fixation
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要点:通过零维动力学建模,揭示了在大气压力下Ar-N2-H2非热等离子体中Ar掺杂对催化合成氨的影响机制,发现Ar掺杂主要通过影响气相中的氮和氢自由基衍生的NHx表面物种参与Eley-Rideal (E-R) 表面反应来增强NH3的形成。

方法:采用kHz频率的等离子体源,在接近室温的条件下,开发了一个共轴式介质阻挡放电石英棉填充床反应器的动力学模型。

实验:在760 Torr的条件下,在1:1的N2-H2等离子体中掺入30%的Ar,发现NH3的生成主要由表面NHx物种参与的E-R表面反应主导,而激发态的N2分子的影响可以忽略。与常见的由Ar(4s)和Ar(4p)对N2的Penning激发产生激发态N2分子在助催化形成NH3中起显著作用的机制相反,我们的模型显示,Ar掺杂增强NH3形成的原因不太可能是Ar和H物种之间的相互作用,因为相比于电子,激发态Ar原子对H2解离形成H自由基的影响较弱。

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