Study of SiO2 Films Implanted with 64zn+ Ions and Oxidized at Elevated Temperatures

V. V. Privezentsev,A. P. Sergeev,A. A. Firsov,V. S. Kulikauskas,V. V. Zatekin,E. P. Kirilenko,A. V. Goryachev,V. A. Kovalskiy

JOURNAL OF SURFACE INVESTIGATION（2024）

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Key words

SiO2 film,Zn implantation,oxidation,Rutherford backscattering,time-of-flight secondary-ion mass spectrometry,Auger electron spectroscopy,Raman scattering

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