Impact of Top SiO2 Interlayer Thickness on Memory Window of Si Channel FeFET with TiN/SiO2/Hf0.5Zr0.5O2/SiOx/Si (MIFIS) Gate StructureTao Hu,Xianzhou Shao,Mingkai Bai,Xinpei Jia,Saifei Dai,Xiaoqing Sun,Runhao Han, Jia Yang,Xiaoyu Ke,Fengbin Tian, Shuai Yang,Junshuai Chai,Hao Xu,Xiaolei Wang,Wenwu Wang,Tianchun Yearxiv（2024）引用 0|浏览19AI 理解论文溯源树样例生成溯源树，研究论文发展脉络Chat Paper正在生成论文摘要
