Improving the Ferroelectric Properties of Nd:HfO $_{\text{2}}$ Thin Films by Stacking Hf $_{\text{0.5}}$ Zr $_{\text{0.5}}$ O $_{\text{2}}$ Interlayers
IEEE Transactions on Electron Devices（2024）
Key words
Chemical solution deposition (CSD),fatigue resistance,ferroelectricity,Nd:HfO $_{\text{2}}$ thin films,polarization retention
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