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Material and Process Optimization for EUV Pattern Rectification by DSA

Lander Verstraete,Hyo Seon Suh, Julie Van Bel, Byeong-U Bak, Seong Eun Kim,Remi Vallat,Philippe Bezard,Matteo Beggiato,Christophe Beral

NOVEL PATTERNING TECHNOLOGIES 2024（2024）

Cited 2|Views17
Key words
Directed Self-Assembly,EUV Lithography,Pattern Rectification,PS-b-PMMA,EUV stochastics
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