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Study of MEEF Improvement with Low-N Absorber EUVL Mask

Yosuke Takahata,Tatiana Kovalevich,Danilo De Simone,Yusuke Tanaka,Vicky Philipsen

OPTICAL AND EUV NANOLITHOGRAPHY XXXVII（2024）

Cited 1|Views5
Key words
Extreme ultraviolet lithography,MEEF,low-n absorber mask,mask 3D effects,MOR,S-Litho EUV
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