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Silicon-Compatible Ferroelectric Tunnel Junctions with a SiO2/Hf0.5Zr0.5O2 Composite Barrier As Low-Voltage and Ultra-High-Speed Memristors

ADVANCED MATERIALS(2024)

Cited 2|Views25
Key words
artificial synapse,ferroelectric tunnel junction,hafnium dioxide,memristor,ultrafast operation speed
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