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A Route to MoO2 Film Fabrication Via Atomic Layer Deposition Using Mo(IV) Precursor and Oxygen Reactant for DRAM Applications

Ceramics International(2024)

引用 2|浏览16
关键词
Molybdenum oxide (MoO x ),Dynamic random access memory (DRAM),Atomic layer deposition (ALD),Oxidant modulating
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