The EUV-Lamp: A Discharge-Produced Metrology EUV Source
Photon Sources for Lithography and Metrology（2023）
Research Support Instruments (United States)
Abstract
Extreme-ultraviolet lithography (EUVL) is increasingly being used in the production of cutting-edge ICs. While the industrial focus is on the maturing of the scanners as driven by high volume manufacturing (HVM) sources, supporting research and supply chain infrastructure was, is, and will be a cornerstone for its development, ramp-up, and sustainability. In the current EUV scanners of ASML, which print more than 100 wafers/hour, HVM sources that generate more than 1 kW of in-band EUV radiation at 13.5 ± 2% nm are used, of which up to 250W is collected in the intermediate focus. The sources currently used in EUVL scanners are the result of broad R&D activities dating back about 20 years.
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Key words
Extreme Ultraviolet Lithography,Electron Beam Lithography,Laser Voltage Probing,Environmental Scanning Electron Microscopy
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