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Atomic Layer Deposition of Titanium Oxide-Based Films for Semiconductor Applications-Effects of Precursor and Operating Conditions.

Vladyslav Matkivskyi,Oskari Leiviska,Sigurd Wenner,Hanchen Liu,Ville Vahanissi,Hele Savin,Marisa Di Sabatino,Gabriella Tranell

MATERIALS（2023）

Cited 2|Views17
Key words
atomic layer deposition,titanium oxide,passivation films,ALD precursors
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