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Physical Dose Modeling and Throughput Optimization in EUV Computational Lithography

Austin Peng, Christopher Kaplan, Jeff Lu,Michael Crouse, Zuanyi Li, Xiaobo Xie,David Rio, Achim Woessner, Alexander Tan,Cuiping Zhang, Xiaoyang Jason Li,Dezheng Sun,Stephen . Hsu,Rafael C. Howell

Optical and EUV Nanolithography XXXVI（2023）

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