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Silicon Oxynitride Thin Films by Plasma-Enhanced Atomic Layer Deposition Using a Hydrogen-Free Metal-Organic Silicon Precursor and N2 Plasma

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING(2023)

Cited 4|Views16
Key words
Silicon oxynitride(SiOxNy),Hydrogen-free precursor,Density functional theory (DFT),Atomic layer deposition (ALD)
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