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Green Deep‐uv Photoresist Based on Chitosan for Microelectronics

Olha Sysova,Paule Durin,Corinne Gablin,Didier Leonard,Alexandre Teolis,Stephane Trombotto,Thierry Delair,Dominique Berling,Isabelle Servin,Raluca Tiron,Arnaud Bazin,Jean-Louis Leclercq,Yann Chevolot,Olivier Soppera

JOURNAL OF APPLIED POLYMER SCIENCE（2023）

引用 4|浏览36
关键词
biosourced materials,chitosan,deep-UV,photoacid generator,photolithography,photoresist
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