Effect of residual impurities on polarization switching kinetics in atomic-layer-deposited ferroelectric Hf0.5Zr0.5O2 thin films(vol 222, 117405, 2022)Dong Hyun Lee,Geun Taek Yu,Ju Yong Park,Se Hyun Kim,Kun Yang,Geun Hyeong Park,Jin Ju Ryu,Je In Lee,Gun Hwan Kim,Min Hyuk ParkACTA MATERIALIA（2023）引用 0|浏览15AI 理解论文溯源树样例生成溯源树，研究论文发展脉络Chat Paper正在生成论文摘要
