Atomically Thin Metal-Dielectric Heterostructures by Atomic Layer Deposition

Pallabi Paul,Paul Schmitt,Vilborg Vala Sigurjonsdottir,Kevin Hanemann,Nadja Felde,Sven Schroeder,Felix Otto,Marco Gruenewald,Torsten Fritz,Vladimir Roddatis,Andreas Tunnermann,Adriana Szeghalmi

ACS APPLIED MATERIALS & INTERFACES（2023）

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atomic layer deposition,ultrathin metallic layers,iridium,aluminum oxide,metal-dielectric heterostructures,interfaces,structural and optical properties

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