Scalable Fabrication of Metallic Nanogaps Using CMOS-based 10 Nm Spacer Lithography
2022 IEEE 22nd International Conference on Nanotechnology (NANO)（2022）
Key words
nanoscale sensing,nanophotonics,nanoelectronics,silicon nitride spacer,laboratory nanofabrication techniques,CMOS-based spacer lithography,complementary metal-oxide-semiconductor technology,spacer fabrication process,low throughput,Moores law,metallic nanogaps,scalable fabrication,nanopatterning technique,etching techniques,deposition techniques,Cr-Au,SiN
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