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Outlook for High-Na EUV Patterning: a Holistic Patterning Approach to Address Upcoming Challenges

Angelique Raley,Lior Huli,Steven Grzeskowiak,Katie Lutker-Lee,Alexandra Krawicz,Yannick Feurprier,Eric Liu,Kanzo Kato,Kathleen Nafus,Arnaud Dauendorffer,Nayoung Bae, Josh LaRose,Andrew Metz,Dave Hetzer,Masanobu Honda,Tetsuya Nishizuka,Akiteru Ko,Soichiro Okada,Yasuyuki Ido,Tomoya Onitsuka,Shinichiro Kawakami,Seiji Fujimoto,Satoru Shimura,Cong Que Dinh,Makoto Muramatsu,Peter Biolsi,Hiromasa Mochiki,Seiji Nagahara

Advanced Etch Technology and Process Integration for Nanopatterning XI（2022）

Cited 17|Views25
Key words
EUV,ASD,ALE,ESPERTTM,High-NA,patterning
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