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Development of a Standalone Zoneplate Based EUV Mask Defect Review Tool

Chami Perera, Gi Sung Yoon, Ryan Carlson, Baorui Yang, Mike Hermes,Dave Houser, Alexander Khodarev, Chuck Murray, Travis Grodt,Arnaud Allézy,Weilun Chao,Farhad Salmassi,Eric Gullikson,Patrick Naulleau

Optical and EUV Nanolithography XXXV（2022）

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关键词
Mask Design,Fault Localization
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