基于硅晶格常数的纳米线宽计量技术
Metrology Science and Technology（2022）
Abstract
随着集成电路中关键尺寸的不断减小，测量精度要求达到原子级才能保证器件的有效性，这给纳米线宽的精确测量带来了新的挑战。2018年第26届国际计量大会提出使用硅{220}晶面间距作为米定义的复现方式，这为原子尺度纳米线宽计量技术提供了新的思路与方法。目前，我国已掌握基于硅晶格常数的纳米线宽计量技术的原理，研制了系列小量值纳米线宽标准器，建立了纳米线宽的智能化定值方法，为初步建立我国自己的原子尺度纳米线宽计量溯源体系奠定了基础。此外，介绍了我国纳米线宽计量技术下一阶段的研究目标，并对我国纳米线宽计量技术未来在国际的影响力，以及在我国自主知识产权大规模集成电路发展中的支撑作用作出了展望。
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Key words
lattice constant of silicon,nanowire width,transmission electron microscopy,key dimensions,traceability
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