Rapid Area Deactivation for Blocking Atomic Layer Deposition Processes Using Polystyrene Brush LayersCaitlin McFeely,Matthew Snelgrove,Kyle Shiel,Gregory Hughes,Pravind Yadav,Ross Lundy,Michael A. Morris,Enda McGlynn,Robert O'ConnorJOURNAL OF MATERIALS CHEMISTRY C（2022）引用 2|浏览27AI 理解论文溯源树样例生成溯源树，研究论文发展脉络Chat Paper正在生成论文摘要
