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Spectroscopy: a New Route Towards Critical-Dimension Metrology of the Cavity Etch of Nanosheet Transistors

Janusz Bogdanowicz,Yusuke Oniki,Karine Kenis, Yusuke Muraki,Thomas Nuytten,Stefanie Sergeant,Alexis Franquet,Valentina Spampinato,Thierry Conard,Ilse Hoflijk,Johan Meersschaut,Niels Claessens,Alain Moussa,Dieter Van den Heuvel,Joey Hung,Roy Koret,Anne-Laure Charley,Philippe Leray

Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV（2021）

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