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(Invited) Atomic Layer Deposition of MOF from Dissolved Precursors ― ‘solution ALD’ (Sald)

Maissa K. S. Barr,Soheila Nadiri,Dong-Hui Chen,Peter G. Weidler,Helmut - Baumgart,Engelbert Redel,Ceyla Asker,Karen Forberich,Felix Hoga,Tobias Stubhan,Hans Egelhaaf,Christoph Brabec,Julien Bachmann

ECS Meeting Abstracts（2020）

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