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EUV Dark Field Lithography: Extreme Resolution by Blocking 0th Order

Timothy A. Brunner, Jara G. SantaClara,Gerardo Bottiglieri,Christopher N. Anderson,Patrick Naulleau

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY XII（2021）

Cited 4|Views7
Key words
EUV,EUV Imagery,Mask3D,High Resolution,Resist screening,EUV resist characterization,F2X,high NA EUV,Resist Process
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