Optimized Phase-Shifting Masks for High-Resolution Resist Patterning by Interference Lithography
INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2017（2017）
Key words
laboratory exposure tool,achromatic Talbot lithography,resist characterization,phase-shifting masks,aerial image contrast,EUV,transmission masks,high-resolution patterning
AI Read Science
Must-Reading Tree
Example
Generate MRT to find the research sequence of this paper
Chat Paper
Summary is being generated by the instructions you defined