The Soft X-Ray Lithography Performance under Typical Single-digit Nm Logic Design Rules, Including Stochastics and Defectivity
NANOFABRICATION HANDBOOK（2012）
Key words
single-digit nm logic design rules,photolithography process,perpendicular line structures,single-digit nm Logic Process,aerial image simulator,Rigorous Coupled Wave Analysis,Abbe imaging algorithms,immersion lithography process,Soft X-Ray lithography process,RCWA,SXR lithography process,line end to line end structures,defectivity models,size 193.0 nm
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