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Defect Profiling in FEFET Si:HfO2 Layers

B. J. O'Sullivan,V Putcha,R. Izmailov,V Afanas'ev,E. Simoen,T. Jung,Y. Higashi,R. Degraeve,B. Truijen,B. Kaczer,N. Ronchi,S. McMitchell,K. Banerjee,S. Clima,L. Breuil,G. Van den Bosch,D. Linten,J. Van Houdt

Applied physics letters（2020）

Cited 33|Views67

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