Development of silicon nitride films for gate dielectric applicationsD Brady,VHC Watt,A Karamcheti,G Bersuker, S Kim,L Vishnubhotla, P Zietzoff, M Gilmer,J Guan,K Torres,B Nguyen, G Williamson, G Brown,G Gale, M Jackson,HR HuffELECTROCHEMICAL SOCIETY SERIES（1999）引用 1|浏览3AI 理解论文溯源树样例生成溯源树，研究论文发展脉络Chat Paper正在生成论文摘要
