Introduction of Pre-Etch Deposition Techniques in EUV Patterning

Xun Xiang,Genevieve Beique,Lei Sun,Andre Labonte,Catherine Labelle,Bhaskar Nagabhirava,Phil Friddle, Stefan Schmitz,Michael Goss,Dominik Metzler,John Arnold

ADVANCED ETCH TECHNOLOGY FOR NANOPATTERNING VII（2018）

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Pre-etch deposition,EUV patterning,EUV quad-layer stack,hard mask open,dry etch,plasma,EUV resist budget,isolated trench,LWR,LER,wiggling factor,tip-to-tip,2D etch bias ratio

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