Fast Optimization of Defect Compensation and Optical Proximity Correction for Extreme Ultraviolet Lithography Mask
Optics Communications（2019）
关键词
EUV lithography,Mask diffraction,Defect compensation,Optical proximity correction,Machine learning,Covariance matrix adaption
AI 理解论文
溯源树
样例
生成溯源树，研究论文发展脉络
Chat Paper
正在生成论文摘要