A Study on SADP Process Refresh for Patterning Correction

James Hsueh-Chung Chen, Isabel C. Estrada-Raygoza,Cornelius Brown Peethala,Yann Mignot,Hosadurga Shobha,Theodorus E. Standaert

2018 IEEE International Interconnect Technology Conference (IITC)（2018）

Cited 0|Views44

Key words

patterning techniques,SADP/SAQP integration,hard-masks,multiple etch steps,mandrel patterning,FEOL/BEOL line levels,patterning correction,SADP process refresh,dry etch,misprocessed wafer,SADP patterning

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