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Interface Preservation During Ge-rich Source/drain Contact Formation

C. Niu,M. Raymond,V. Kamineni,J. Fronheiser,S. Siddiqui,H. Niimi,J. M. Dechene,A. Labonte,P. Adusumilli,A. V. Carr,J. Shearer,J. Demarest,L. Jiang,J. Li, R. W. Hengstebeck

2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)（2016）

Cited 2|Views34
Key words
Interface,SiGe,Ge,Contact
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