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Impact of Plasma Reactive Ion Etching on Low Dielectric Constant Porous Organosilicate Films' Microstructure and Chemical Composition

Matthieu Lepinay,Daniel Lee, Riccardo Scarazzini,Michel Bardet,Marc Veillerot,Lucile Broussous,Christophe Licitra,Vincent Jousseaume,Francois Bertin,Vincent Rouessac,Andre Ayral

Microporous and Mesoporous Materials（2016）

引用 8|浏览53
关键词
Low-k dielectric,Ellipso-porosimetry,NMR,ToF-SIMS,Plasma,Porous organosilicate
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