Critical Dimension Scanning Electron Microscope Local Overlay Measurement and Its Application for Double Patterning of Complex Shapes

Shoji Hotta,Takumichi Sutani,Scott Halle,Daniel Moore,Chas Archie,Akiyuki Sugiyama,Masahiko Ikeno,Atsuko Yamaguchi,Kazuyoshi Torii

JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS（2011）

Cited 8|Views9

Key words

critical dimension scanning electron microscope,overlay measurement,double patterning,pattern symmetry,measurement uncertainty,overlay model,correlation,hybrid metrology

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